The construction of an integrated passenger transportation hub cluster system with a relatively compact spatial structure, complementary and integrated function, reliable resilience, efficient organization, and convenient service is the key to significantly enhancing the overall evacuation capacity and level of travel service of the urban agglomeration transportation network, so as to realize the optimization of the resource allocation of the urban agglomeration transportation, promote the adjustment of the spatial structure of urban agglomeration, and support and lead the coordinated development of the region. With the objective of creating a modern and high-quality national comprehensive three-dimensional transportation network and building a world-class hub cluster network, on the basis of systematically sorting out the current development status of integrated passenger transportation hubs worldwide, this paper analyzes the development needs and challenges of China’s integrated passenger transportation hub clusters and proposes the development goal of integrated passenger transportation hub clusters and the research proposal for coordinated development.

Integrated circuit (IC) chips play a more and more important role in everyday life and the national economy, and the capability of manufacturing chips is a key indicator of a nation’s technology status. Due to the Wassenaar Arrangement, China cannot import the extreme ultraviolet (EUV) lithography technique, and thus ArF immersion lithography with the multi-patterning process is essential to the development of ICs, which poses higher requirements for lithographic materials used in the multi-patterning process. In this paper, we summarize the paths of the multi-patterning process and lithographic materials involved upon the review of the development of lithography technology. Moreover, we analyze the technical development of and challenges faced by advanced lithographic materials such as ArF immersion photoresists, pattern shrink materials, and trilayer materials (spin-on glass and spin-on carbon). The review and outlook of the technical evolution indicate that the passive equipment-driven development mode of lithographic materials has transformed into the coordinated development mode of material innovation and equipment processes. In particular, with limited equipment, China should take the innovation of materials as the driver to develop an IC path with Chinese characteristics.

First, technical features, evolution and development trend of liquid rocket engine for space launch vehicles are discussed. Then, key technical problems, research direction and content that need to be focused on in the future are presented. Finally, taking account of the development status, problems and challenges of liquid rocket engines in China, some development proposals are put forward.